Self-Assembled Nanodot Fabrication by Using PS-PDMS Block Copolymer

نویسندگان

  • Miftakhul Huda
  • You Yin
  • Sumio Hosaka
چکیده

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Chemical and Physical Methods of the Templated Direction of Block Copolymers

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Templated self-assembly of block copolymers using topographic templates is attractive because it can generate dense nanoscale patterns over a large area with a periodicity down to 10 nm. In our previous work, regular patterns were achieved by using a polystyrene-bpolydimethylsiloxane (PS-b-PDMS) block copolymer and topographic templates . However, more complex block-copolymer patterns required ...

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Templated self-assembly of block copolymers using topographic templates is attractive because it can generate dense nanoscale patterns over a large area with a periodicity down to 10 nm. In our previous work, regular patterns were achieved by using a polystyrene-bpolydimethylsiloxane (PS-b-PDMS) block copolymer and topographic templates . However, more complex block-copolymer patterns required ...

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Templated self-assembly of block copolymers using topographic templates is attractive because it can generate dense nanoscale patterns over a large area with a periodicity down to 10 nm. In our previous work, regular patterns were achieved by using a polystyrene-bpolydimethylsiloxane (PS-b-PDMS) block copolymer and topographic templates . However, more complex block-copolymer patterns required ...

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تاریخ انتشار 2017